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Author: Changhwan Shin
Publisher: Springer
ISBN: 9401775974
Category : Technology & Engineering
Languages : en
Pages : 140
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Book Description
This book provides a comprehensive overview of contemporary issues in complementary metal-oxide semiconductor (CMOS) device design, describing how to overcome process-induced random variations such as line-edge-roughness, random-dopant-fluctuation, and work-function variation, and the applications of novel CMOS devices to cache memory (or Static Random Access Memory, SRAM). The author places emphasis on the physical understanding of process-induced random variation as well as the introduction of novel CMOS device structures and their application to SRAM. The book outlines the technical predicament facing state-of-the-art CMOS technology development, due to the effect of ever-increasing process-induced random/intrinsic variation in transistor performance at the sub-30-nm technology nodes. Therefore, the physical understanding of process-induced random/intrinsic variations and the technical solutions to address these issues plays a key role in new CMOS technology development. This book aims to provide the reader with a deep understanding of the major random variation sources, and the characterization of each random variation source. Furthermore, the book presents various CMOS device designs to surmount the random variation in future CMOS technology, emphasizing the applications to SRAM.
Author: Changhwan Shin
Publisher: Springer
ISBN: 9401775974
Category : Technology & Engineering
Languages : en
Pages : 140
Get Book
Book Description
This book provides a comprehensive overview of contemporary issues in complementary metal-oxide semiconductor (CMOS) device design, describing how to overcome process-induced random variations such as line-edge-roughness, random-dopant-fluctuation, and work-function variation, and the applications of novel CMOS devices to cache memory (or Static Random Access Memory, SRAM). The author places emphasis on the physical understanding of process-induced random variation as well as the introduction of novel CMOS device structures and their application to SRAM. The book outlines the technical predicament facing state-of-the-art CMOS technology development, due to the effect of ever-increasing process-induced random/intrinsic variation in transistor performance at the sub-30-nm technology nodes. Therefore, the physical understanding of process-induced random/intrinsic variations and the technical solutions to address these issues plays a key role in new CMOS technology development. This book aims to provide the reader with a deep understanding of the major random variation sources, and the characterization of each random variation source. Furthermore, the book presents various CMOS device designs to surmount the random variation in future CMOS technology, emphasizing the applications to SRAM.
Author: Victor Champac
Publisher: Springer
ISBN: 3319754653
Category : Technology & Engineering
Languages : en
Pages : 185
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Book Description
This book discusses the digital design of integrated circuits under process variations, with a focus on design-time solutions. The authors describe a step-by-step methodology, going from logic gates to logic paths to the circuit level. Topics are presented in comprehensively, without overwhelming use of analytical formulations. Emphasis is placed on providing digital designers with understanding of the sources of process variations, their impact on circuit performance and tools for improving their designs to comply with product specifications. Various circuit-level “design hints” are highlighted, so that readers can use then to improve their designs. A special treatment is devoted to unique design issues and the impact of process variations on the performance of FinFET based circuits. This book enables readers to make optimal decisions at design time, toward more efficient circuits, with better yield and higher reliability.
Author: Brajesh Kumar Kaushik
Publisher: CRC Press
ISBN: 1351670212
Category : Science
Languages : en
Pages : 410
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Book Description
The primary aim of this book is to discuss various aspects of nanoscale device design and their applications including transport mechanism, modeling, and circuit applications. . Provides a platform for modeling and analysis of state-of-the-art devices in nanoscale regime, reviews issues related to optimizing the sub-nanometer device performance and addresses simulation aspect and/or fabrication process of devices Also, includes design problems at the end of each chapter
Author: Radek Silhavy
Publisher: Springer
ISBN: 3319572644
Category : Technology & Engineering
Languages : en
Pages : 446
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Book Description
This book presents new methods for and approaches to real-world problems as well as exploratory research describing novel mathematics and cybernetics applications in intelligent systems. It focuses on modern trends in selected fields of technological systems and automation control theory. It also introduces new algorithms, methods and applications of intelligent systems in automation, technological and industrial applications. This book constitutes the refereed proceedings of the Cybernetics and Mathematics Applications in Intelligent Systems Section of the 6th Computer Science On-line Conference 2017 (CSOC 2017), held in April 2017.
Author: Soumen Banerjee
Publisher: Springer Nature
ISBN: 9811594333
Category : Technology & Engineering
Languages : en
Pages : 484
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Book Description
This book is a collection of best selected research papers presented at the 6th International Conference on Opto-Electronics and Applied Optics (OPTRONIX 2020) organized by the University of Engineering & Management, Kolkata, India, in June 2020. The primary focus is to address issues and developments in optoelectronics with particular emphasis on communication technology, IoT and intelligent systems, information processing and its different kinds. The theme of the book is in alignment with the theme of the conference “Advances in Smart Communication Technology and Information Processing.” The purpose of this book is to inform the scientists and researchers of this field in India and abroad about the latest developments in the relevant field and to raise awareness among the academic fraternity to get them involved in different activities in the years ahead – an effort to realize knowledge-based society.
Author:
Publisher: ASM International
ISBN: 1627080996
Category :
Languages : en
Pages :
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Book Description
The International Symposium for Testing and Failure Analysis (ISTFA) 2018 is co-located with the International Test Conference (ITC) 2018, October 28 to November 1, in Phoenix, Arizona, USA at the Phoenix Convention Center. The theme for the November 2018 conference is "Failures Worth Analyzing." While technology advances fast and the market demands the latest and the greatest, successful companies strive to stay competitive and remain profitable.
Author:
Publisher: Academic Press
ISBN: 012812296X
Category : Technology & Engineering
Languages : en
Pages : 1881
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Book Description
Comprehensive Nanoscience and Technology, Second Edition, Five Volume Set allows researchers to navigate a very diverse, interdisciplinary and rapidly-changing field with up-to-date, comprehensive and authoritative coverage of every aspect of modern nanoscience and nanotechnology. Presents new chapters on the latest developments in the field Covers topics not discussed to this degree of detail in other works, such as biological devices and applications of nanotechnology Compiled and written by top international authorities in the field
Author: Michael Fulde
Publisher: Springer Science & Business Media
ISBN: 9048132800
Category : Technology & Engineering
Languages : en
Pages : 131
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Book Description
Since scaling of CMOS is reaching the nanometer area serious limitations enforce the introduction of novel materials, device architectures and device concepts. Multi-gate devices employing high-k gate dielectrics are considered as promising solution overcoming these scaling limitations of conventional planar bulk CMOS. Variation Aware Analog and Mixed-Signal Circuit Design in Emerging Multi-Gate CMOS Technologies provides a technology oriented assessment of analog and mixed-signal circuits in emerging high-k and multi-gate CMOS technologies.
Author: Martin Wirnshofer
Publisher: Springer Science & Business Media
ISBN: 9400761961
Category : Technology & Engineering
Languages : en
Pages : 91
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Book Description
Increasing performance demands in integrated circuits, together with limited energy budgets, force IC designers to find new ways of saving power. One innovative way is the presented adaptive voltage scaling scheme, which tunes the supply voltage according to the present process, voltage and temperature variations as well as aging. The voltage is adapted “on the fly” by means of in-situ delay monitors to exploit unused timing margin, produced by state-of-the-art worst-case designs. This book discusses the design of the enhanced in-situ delay monitors and the implementation of the complete control-loop comprising the monitors, a control-logic and an on-chip voltage regulator. An analytical Markov-based model of the control-loop is derived to analyze its robustness and stability. Variation-Aware Adaptive Voltage Scaling for Digital CMOS Circuits provides an in-depth assessment of the proposed voltage scaling scheme when applied to an arithmetic and an image processing circuit. This book is written for engineers interested in adaptive techniques for low-power CMOS circuits.
Author: Steve Kupke
Publisher: BoD – Books on Demand
ISBN: 3741208698
Category : Technology & Engineering
Languages : en
Pages : 125
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Book Description
After many decades, the scaling of silicon dioxide based field-effect transistors has reached insurmountable physical limits due unintentional high gate leakage currents for gate oxide thicknesses below 2 nm. The introduction of high-k metal gate stacks guaranteed the trend towards smaller transistor dimensions. The implementation of HfO2, as high-k dielectric, also lead to a substantial number of manufacturing and reliability challenges. The deterioration of the gate oxide properties under thermal and electric stress jeopardizes the circuit operation and hence needs to be comprehensively understood. As a starting point, 6T static random access memory cells were used to identify the different single device operating conditions. The strongest deterioration of the gate stack was found for nMOS devices under positive bias temperature instability (PBTI) stress, resulting in a severe threshold voltage shift and increased gate leakage current. A detailed investigation of physical origin and temperature and voltage dependency was done. The reliability issues were caused by the electron trapping into already existing HfO2 oxygen vacancies. The oxygen vacancies reside in different charge states depending on applied stress voltages. This in return also resulted in a strong threshold voltage and gate current relaxation after stress was cut off. The reliability assessment using constant voltage stress does not reflect realistic circuit operation which can result in a changed degradation behaviour. Therefore, the constant voltage stress measurement were extended by considering CMOS operational constraints, where it was found that the supply voltage frequently switches between the gate and drain terminal. The additional drain (off-state) bias lead to an increased Vt relaxation in comparison to zero bias voltage. The off-state influence strongly depended on the gate length and became significant for short channel devices. The influence of the off-state bias on the dielectric breakdown was studied and compared to the standard assessment methods. Different wear-out mechanisms for drain-only and alternating gate and drain stress were verified. Under drain-only stress, the dielectric breakdown was caused by hot carrier degradation. The lifetime was correlated with the device length and amount of subthreshold leakage. The gate oxide breakdown under alternating gate and o-state stress was caused by the continuous trapping and detrapping behaviour of high-k metal gate devices.
