Surface and Interface Characterization by Electron Optical Methods PDF Download
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Author: Ugo Valdre
Publisher: Springer Science & Business Media
ISBN: 1461595371
Category : Science
Languages : en
Pages : 321
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Book Description
The importance of real space imaging and spatially-resolved spectroscopy in many of the most significant problems of surface and interface behaviour is almost self evident. To join the expertise of the tradi tional surface scientist with that of the electron microscopist has however been a slow and difficult process. In the past few years remarkable progress has been achieved, including the development of new techniques of scanning transmission and reflection imaging as well as low energy microscopy, all carried out in greatly improved vacuum conditions. Most astonishing of all has been the advent of the scanning tunneling electron microscope providing atomic resolution in a manner readily compatible with most surface science diagnostic procedures. The problem of beam damage, though often serious, is increasingly well understood so that we can assess the reliability and usefulness of the results which can now be obtained in catalysis studies and a wide range of surface science applications. These new developments and many others in more established surface techniques are all described in this book, based on lectures given at a NATO Advanced Study Institute held in Erice, Sicily, at Easter 1987. It is regretted that a few lectures on low energy electron diffraction and channeling effects could not be included. Fifteen lecturers from seven different Countries and 67 students from 23 Countries and a wide variety of backgrounds attended the school.
Author: Ugo Valdre
Publisher: Springer Science & Business Media
ISBN: 1461595371
Category : Science
Languages : en
Pages : 321
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Book Description
The importance of real space imaging and spatially-resolved spectroscopy in many of the most significant problems of surface and interface behaviour is almost self evident. To join the expertise of the tradi tional surface scientist with that of the electron microscopist has however been a slow and difficult process. In the past few years remarkable progress has been achieved, including the development of new techniques of scanning transmission and reflection imaging as well as low energy microscopy, all carried out in greatly improved vacuum conditions. Most astonishing of all has been the advent of the scanning tunneling electron microscope providing atomic resolution in a manner readily compatible with most surface science diagnostic procedures. The problem of beam damage, though often serious, is increasingly well understood so that we can assess the reliability and usefulness of the results which can now be obtained in catalysis studies and a wide range of surface science applications. These new developments and many others in more established surface techniques are all described in this book, based on lectures given at a NATO Advanced Study Institute held in Erice, Sicily, at Easter 1987. It is regretted that a few lectures on low energy electron diffraction and channeling effects could not be included. Fifteen lecturers from seven different Countries and 67 students from 23 Countries and a wide variety of backgrounds attended the school.
Author: D.J. O'Connor
Publisher: Springer Science & Business Media
ISBN: 366205227X
Category : Technology & Engineering
Languages : en
Pages : 588
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Book Description
This guide to the use of surface analysis techniques, now in its second edition, has expanded to include more techniques, current applications and updated references. It outlines the application of surface analysis techniques to a broad range of studies in materials science and engineering. The book consists of three parts: an extensive introduction to the concepts of surface structure and composition, a techniques section describing 19 techniques and a section on applications. This book is aimed at industrial scientists and engineers in research and development. The level and content of this book make it ideal as a course text for senior undergraduate and postgraduate students in materials science, materials engineering, physics, chemistry and metallurgy.
Author: John C. Riviere
Publisher: CRC Press
ISBN: 1420007807
Category : Science
Languages : en
Pages : 671
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Book Description
The original Handbook of Surface and Interface Analysis: Methods for Problem-Solving was based on the authors' firm belief that characterization and analysis of surfaces should be conducted in the context of problem solving and not be based on the capabilities of any individual technique. Now, a decade later, trends in science and technology appear
Author: Hans Lüth
Publisher: Springer Science & Business Media
ISBN: 3662101599
Category : Technology & Engineering
Languages : en
Pages : 497
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Book Description
"Surfaces and Interfaces of Solids" emphasizes both experimental and theoretical aspects of surface and interface physics. Beside the techniques of preparing well-defined solid surfaces and interfaces basic models for the description of structural, vibronic and electronic properties ofinterfaces are described, as well as fundamental aspects of adsorption and layer growth. Because of its importance for modern microelectronics special emphasis is placed on the electronic properties of semiconductorinterfaces and heterostructures. Experimental topics covering the basics of ultrahigh-vacuum technology, electron optics, surface spectroscopies and electrical interface characterization techniques are presented in the form of separate panels.
Author: Hans Lüth
Publisher: Springer Science & Business Media
ISBN: 3662031329
Category : Technology & Engineering
Languages : en
Pages : 508
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Book Description
Surfaces and Interfaces of Solid Materials emphasises both experimental and theoretical aspects of surface and interface physics. Beside the techniques of preparing well-defined solid surfaces and interfaces basic models for the description of structural, vibronic and electronic properties of interfaces are described, as well as fundamental aspects of adsorption and layer growth. Because of its importance for modern microelectronics special emphasis is placed on the electronic properties of semiconductor interfaces and heterostructures. Experimental topics covering the basics of ultrahigh-vacuum technology, electron optics, surface spectroscopies and electrical interface characterization techniques are presented in the form of separate panels.
Author: Peter W. Hawkes
Publisher: Academic Press
ISBN: 0128189800
Category : Technology & Engineering
Languages : en
Pages : 562
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Book Description
Principles of Electron Optic: Volume Three: Wave Optics, discusses this essential topic in microscopy to help readers understand the propagation of electrons from the source to the specimen, and through the latter (and from it) to the image plane of the instrument. In addition, it also explains interference phenomena, notably holography, and informal coherence theory. This third volume accompanies volumes one and two that cover new content on holography and interference, improved and new modes of image formation, aberration corrected imaging, simulation, and measurement, 3D-reconstruction, and more. The study of such beams forms the subject of electron optics, which divides naturally into geometrical optics where effects due to wavelength are neglected, with wave optics considered. Includes authoritative coverage of the fundamental theory behind electron beams Describes the interaction of electrons with solids and the information that can be obtained from electron-beam techniques Addresses recent, relevant research topics, including new content on holography and interference, new modes of image formation, 3D reconstruction and aberration corrected imaging, simulation and measurement
Author: Gertjan Koster
Publisher: Elsevier
ISBN: 0857094955
Category : Technology & Engineering
Languages : en
Pages : 296
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Book Description
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research. Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth. With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. Chapters review electron diffraction techniques, including the methodology for observations and measurements Discusses the principles and applications of photoemission techniques Examines alternative in situ characterisation techniques
Author: Ernst Bauer
Publisher: Springer
ISBN: 1493909355
Category : Technology & Engineering
Languages : en
Pages : 496
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Book Description
This book, written by a pioneer in surface physics and thin film research and the inventor of Low Energy Electron Microscopy (LEEM), Spin-Polarized Low Energy Electron Microscopy (SPLEEM) and Spectroscopic Photo Emission and Low Energy Electron Microscopy (SPELEEM), covers these and other techniques for the imaging of surfaces with low energy (slow) electrons. These techniques also include Photoemission Electron Microscopy (PEEM), X-ray Photoemission Electron Microscopy (XPEEM), and their combination with microdiffraction and microspectroscopy, all of which use cathode lenses and slow electrons. Of particular interest are the fundamentals and applications of LEEM, PEEM, and XPEEM because of their widespread use. Numerous illustrations illuminate the fundamental aspects of the electron optics, the experimental setup, and particularly the application results with these instruments. Surface Microscopy with Low Energy Electrons will give the reader a unified picture of the imaging, diffraction, and spectroscopy methods that are possible using low energy electron microscopes.
Author: Max G. Lagally
Publisher: Springer Science & Business Media
ISBN: 1461306531
Category : Science
Languages : en
Pages : 519
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Book Description
This volume contains the papers presented at the NATO Advanced Research Workshop on "Kinetics of Ordering and Growth at Surfaces", held in Acquafredda di Maratea, Italy, September 18-22, 1989. The workshop's goal was to bring together theorists and experimentalists from two related fields, surface science and thin-film growth, to highlight their common interests and overcome a lack of communication between these two communities. Typically surface scientists are only concerned with the microscopic (atomic) description of solids within one monolayer of the surface. Thin-film growers are usually considered more empirical in their approach, concerned primarily with the "quality of their product", and have not necessarily found it useful to incorporate surface science understanding into their art. This workshop aimed to counter at least in some measure these stereotypes. Its focus was on generating dialogue on the fundamental structural and kinetic processes that lead to the initial stages of film growth, from both the surface science and crystal growth perspectives. To achieve this, alternate days emphasized the view of surface science and thin-film growth, with considerable time for discussion, a format that appeared to succeed well. The success of the workshop is in large measure due to the efforts of the organizing committee, L. C. Feldman, P. K. Larsen, J. A. Venables, and J. Villain, whose advice on the constitution of the program was invaluable.
Author: S. Amelinckx
Publisher: John Wiley & Sons
ISBN: 3527614559
Category : Technology & Engineering
Languages : en
Pages : 527
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Book Description
Derived from the successful three-volume Handbook of Microscopy, this book provides a broad survey of the physical fundamentals and principles of all modern techniques of electron microscopy. This reference work on the method most often used for the characterization of surfaces offers a competent comparison of the feasibilities of the latest developments in this field of research. Topics include: * Stationary Beam Methods: Transmission Electron Microscopy/ Electron Energy Loss Spectroscopy/ Convergent Electron Beam Diffraction/ Low Energy Electron Microscopy/ Electron Holographic Methods * Scanning Beam Methods: Scanning Transmission Electron Microscopy/ Scanning Auger and XPS Microscopy/ Scanning Microanalysis/ Imaging Secondary Ion Mass Spectrometry * Magnetic Microscopy: Scanning Electron Microscopy with Polarization Analysis/ Spin Polarized Low Energy Electron Microscopy Materials scientists as well as any surface scientist will find this book an invaluable source of information for the principles of electron microscopy.
